Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond release_yi2ab335hfcvrifd7jfkq6ssla

by N. Mojarad, M. Hojeij, L. Wang, J. Gobrecht, Y. Ekinci

Published in Nanoscale by Royal Society of Chemistry (RSC).

2015   p4031-4037

Abstract

Using extreme ultraviolet interference lithography, we demonstrate patterning of different inorganic photoresists, reaching the highest reported photolithography resolution of 7 nm half-pitch.
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Type  article-journal
Stage   published
Year   2015
Language   en ?
DOI  10.1039/c4nr07420c
PubMed  25653148
Wikidata  Q39042973
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ISSN-L:  2040-3364
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