Mechanism and dynamics of the reaction of XeF2 with fluorinated Si(100): Possible role of gas phase dissociation of a surface reaction product in plasmaless etching release_rdbfnnpamjfq5b2l25rlreltl4

by R. C. Hefty, J. R. Holt, M. R. Tate, S. T. Ceyer

Published in Journal of Chemical Physics by AIP Publishing.

2009   Volume 130, Issue 16, p164714

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Date   2009-04-28
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DOI  10.1063/1.3118629
PubMed  19405623
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