Mechanism and dynamics of the reaction of XeF2 with fluorinated Si(100): Possible role of gas phase dissociation of a surface reaction product in plasmaless etching

by R. C. Hefty, J. R. Holt, M. R. Tate, S. T. Ceyer

Published in Journal of Chemical Physics by AIP Publishing.

2009 Volume 130, Issue 16, p164714

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Date 2009-04-28
Language en ^?

DOI 10.1063/1.3118629
PubMed 19405623

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ISSN-L: 0021-9606

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Mechanism and dynamics of the reaction of XeF2 with fluorinated Si(100): Possible role of gas phase dissociation of a surface reaction product in plasmaless etching release_rdbfnnpamjfq5b2l25rlreltl4