Cooperative simulation of lithography and topography for three-dimensional high-aspect-ratio etching release_pcwmhr5t3ngkdnowns2yu3w7mi

by Takashi Ichikawa, Takashi Yagisawa, Shinichi Furukawa, Takafumi Taguchi, Shigeki Nojima, Sadatoshi Murakami, Naoki Tamaoki

Published in Japanese Journal of Applied Physics by Japan Society of Applied Physics.

Volume 57, Issue 6S2 p06JC01 (2018)

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Type  article-journal
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Date   2018-04-11
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ISSN-L:  0021-4922
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