Cooperative simulation of lithography and topography for three-dimensional high-aspect-ratio etching release_pcwmhr5t3ngkdnowns2yu3w7mi

by Takashi Ichikawa, Takashi Yagisawa, Shinichi Furukawa, Takafumi Taguchi, Shigeki Nojima, Sadatoshi Murakami, Naoki Tamaoki

Published in Japanese Journal of Applied Physics by Japan Society of Applied Physics.

Volume 57, Issue 6S2 p06JC01 (2018)

Archived Files and Locations

application/pdf  2.5 MB
file_ey3yrrgnczdnlphorpwpnemijy
iopscience.iop.org (publisher)
web.archive.org (webarchive)
Read Archived PDF
Archived
Type  article-journal
Stage   published
Date   2018-04-11
Journal Metadata
Not in DOAJ
In Keepers Registery
ISSN-L:  0021-4922
Work Entity
access all versions, variants, and formats of this works (eg, pre-prints)
Catalog Record
Revision: 292dea14-affa-4c0a-b9cf-5e71eab03fb0
API URL: JSON