Characterization of the Nonlinear Susceptibility of Monolayer MoS2 using Second- and Third-Harmonic Generation Microscopy release_oeem2g6ylfcozhxmd5qqjm5xae

by R. I. Woodward, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, S. Li, G. Eda, C. J. S. de Matos

Released as a paper-conference by OSA.


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