Thermal Stability of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas release_o2hyugxonrcxfkecl3uhxqlekq

by Sairam Agraharam, Dennis W. Hess, Paul A. Kohl, Sue A. Bidstrup Allen

Published in Journal of the Electrochemical Society by The Electrochemical Society.

2000   Volume 147, p2665

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