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Thermal Stability of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas
release_o2hyugxonrcxfkecl3uhxqlekq
by
Sairam Agraharam, Dennis W. Hess, Paul A. Kohl, Sue A. Bidstrup Allen
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in Journal of the Electrochemical Society by The Electrochemical Society.
2000 Volume 147, p2665
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