Applications of Compact Laser-Driven EUV/XUV Plasma Sources release_mqeuqdjjrfcebkidwxt4nrqapq

by Armin Bayer, Frank Barkusky, Peter Großmann, Klaus Mann

Published in X-Ray Optics and Instrumentation by Hindawi Limited.

2010   Volume 2010, p1-9


We present an overview on the EUV/XUV activities of the Laser-Laboratorium Göttingen based on table-top laser-produced plasma (LPP) sources. As target materials, gaseous jets of noble gases or solid Gold are employed. In order to obtain high EUV fluence, a Schwarzschild objective consisting of two spherical mirrors with Mo/Si multilayer coatings is adapted to the source. By demagnified (10x) imaging of the Au plasma, an EUV spot with a maximum energy density of ∼1.3 J/cm<jats:sup>2</jats:sup>is generated (3 μm diameter, pulse duration 8.8 ns). First applications of this system reveal its potential for high-resolution modification and direct structuring of solid surfaces. Additionally, an EUV/XUV setup for structural analysis was developed. Using a gas puff target combined with a grazing incidence optics (Kirkpatrick-Baez arrangement), it offers the possibility to perform angular resolved reflectivity, diffraction, and scattering experiments. For chemical analysis of various samples, an NEXAFS setup was built, based on gaseous Krypton as a broadband emitter in the water-window range around the carbon K-edge (4.4 nm). Here, proof-of-principle for NEXAFS with lab-scaled XUV sources is given on polyimide as a reference.
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