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Microstructure analysis of polyurethane based polishing materials
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D. I. Terashkevich, E. S. Bokova, A. S. Ginzburg, G. M. Kovalenko
Abstract
This paper presents the results of porous structure analysis of polishing materials based on polyurethanes used in chemicalmechanical planarization process of IC layers.
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Date 2021-03-19
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Date 2021-03-19
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Worldcat
SHERPA/RoMEO (journal policies)
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CORE.ac.uk
Semantic Scholar
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