Ge microdisk with lithographically-tunable strain using CMOS-compatible process release_4bidvx7m2bgefjkwvffgses7bi

by David S. Sukhdeo, Jan Petykiewicz, Shashank Gupta, Daeik Kim, Sungdae Woo, Youngmin Kim, Jelena Vučković, Krishna C. Saraswat, Donguk Nam

Published in Optics Express by The Optical Society.

2015   Volume 23, Issue 26, p33249

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Type  article-journal
Stage   published
Date   2015-12-16
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DOI  10.1364/oe.23.033249
PubMed  26831991
Wikidata  Q35910736
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