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Journal of Micro/Nanolithography
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SPIE - International Society for Optical Engineering
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Example Publications
Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology
2020 | Journal of Micro/Nanolithographydoi:10.1117/1.jmm.19.4.044001
Particle and pattern discriminant freeze-cleaning method
Kei Hattori, Daisuke Matsushima, Kensuke Demura, Masaya Kamiya
2020
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Journal of Micro/Nanolithography
doi:10.1117/1.jmm.19.4.044401
Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer
2020
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Journal of Micro/Nanolithography
doi:10.1117/1.jmm.19.4.041001
High-power EUV lithography: spectral purity and imaging performance
Mark van de Kerkhof, Fei Liu, Marieke Meeuwissen, Xueqing Zhang, Muharrem Bayraktar, Robert de Kruif, Natalia Davydova
2020
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Journal of Micro/Nanolithography
doi:10.1117/1.jmm.19.3.033801